Modelling of rapid thermal processing-Reference-Cited by-同舟云学术

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Modelling of rapid thermal processing

Published:1991-02 Issue:3-4 Volume:10 Page:207-216
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Vandenabeele P.,Maex K.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Rapid thermal multi-processing in micro factories;Saraswat,1989

2. Multi-step, in-situ single wafer processing — materials, device and equipment issues;Hauser,1989

3. Rapid thermal annealing — Theory and Practice;Hill

4. Simulation of temperature effects during rapid thermal processing;Kakoschke,1989

5. Thermal and stress analysis of semiconductor wafers in a rapid thermal processing oven;Lord,1989

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Finite Horizon Markov Decision Process Based Reinforcement Learning Control of a Rapid Thermal Processing system;Journal of Process Control;2018-08

2. Improvement of temperature homogeneity of a silicon wafer heated in a rapid thermal system (RTP: Rapid Thermal Process) by a filtering window;Applied Thermal Engineering;2015-02

3. Annealing and Secondary Defects;Ion Implantation: Basics to Device Fabrication;1995

4. Formation of titanium and cobalt germanides on Si (100) using rapid thermal processing;Journal of Electronic Materials;1992-01

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