Progress in E-beam mask making for optical and x-ray lithography-Reference-Cited by-同舟云学术

Progress in E-beam mask making for optical and x-ray lithography

Published:1991-03 Issue:1-4 Volume:13 Page:141-149
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Pfeiffer Hans C.,Groves Timothy R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Fully scaled 0.5 μm metal–oxide semiconductor circuits by synchrotron x-ray lithography: Mask fabrication and characterization

2. Ohki, S. et. al. Proc. 1989 Intern. Symp. MicroProcess Conf., S. Namba and T. Kitayama, eds. (Komiyama Printing Co., Ltd.) 93.

3. Pilot production of half-micron x-ray masks

4. SOR Lithography in West Germany

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