Pilot production of half-micron x-ray masks-Reference-Cited by-同舟云学术

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Pilot production of half-micron x-ray masks

Published:1989-11 Issue:6 Volume:7 Page:1570
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Hughes Gregory

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03

2. Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas;Japanese Journal of Applied Physics;1993-12-30

3. Etching on silicon membranes for sub-0.25-μm x-ray mask manufacturing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

4. Electron beam lithography tool for manufacture of X-ray masks;IBM Journal of Research and Development;1993-05

5. Tungsten patterning for 1:1 x-ray masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11

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