Author:
Ehrlich Ch.,Breithaupt B.,Demmeler R.,Jacobs E.P.,Köhler C.,Kohlmann K.,Petschner M.,Reimer K.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. Meeting the pattern definition challenge of 256MBit DRAM x-ray masks;Microelectronic Engineering;1993-04
2. Prospects for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11