Simulation assisted design of processes for gray-tone lithography-Reference-Cited by-同舟云学术

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Simulation assisted design of processes for gray-tone lithography

Published:1995-02 Issue:1-4 Volume:27 Page:267-270
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Henke W.,Hoppe W.,Quenzer H.J.,Staudt-Fischbach P.,Wagner B.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Proc. IEEE MicroElectro Mechanical Systems;Hisanaga,1993

2. IOP Conference Focus on Micromechanics;Purdy,1993

3. SPIE Proc. Diffractive and Miniaturized Optics;Gal,1993

4. Proc. European Conference on Optical Communication, ECOC '93;Do¨dissen,1993

5. Proc. IEEE MicroElectro Mechanical Systems;Henke,1994

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of three-dimensional hemispherical structures using photolithography;Microfluidics and Nanofluidics;2009-03-31

2. Gray-tone lithography using an optical diffuser and a contact aligner;Applied Physics Letters;2008-05-12

3. Patterning: Principles and Some New Developments;Advanced Materials;2004-08-04

4. Reduction Photolithography Using Microlens Arrays: Applications in Gray Scale Photolithography;Analytical Chemistry;2002-06-01

5. Design of hybrid micro optical elements with coded gray-tone mask;Microelectronic Engineering;2001-09

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