Modeling and simulation of a chemically amplified DUV resist using the effective acid concept-Reference-Cited by-同舟云学术

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Modeling and simulation of a chemically amplified DUV resist using the effective acid concept

Published:1995-02 Issue:1-4 Volume:27 Page:405-408
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Weiß M.,Binder H.,Schwalm R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference2 articles.

1. Development of positive photoresist;Kim;IEEE Trans. Elec. Dev.,1984

2. JESSI-Project E162: status of the deep-UV resist;Funhoff;SPIE,1993

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