Optimizing synchroton-based x-ray lithography for 0.1 μm lithography-Reference-Cited by-同舟云学术

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Optimizing synchroton-based x-ray lithography for 0.1 μm lithography

Published:1994-01 Issue:1-4 Volume:23 Page:203-206
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Hector Scott D.,Smith Henry I.,Gupta Nitin,Schattenburg M.L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Performance of a wide-field flux delivery system for synchrotron x-ray lithography

2. Simultaneous optimization of spectrum, spatial coherence, gap, feature bias, and absorber thickness in synchrotron-based x-ray lithography

3. Computer simulations of resist profiles in x‐ray lithography

4. Diffraction effects on pattern replication with synchrotron radiation

5. A new perspective on proximity printing: From ultraviolet to x ray

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