Simultaneous optimization of spectrum, spatial coherence, gap, feature bias, and absorber thickness in synchrotron-based x-ray lithography
-
Published:1993-11
Issue:6
Volume:11
Page:2981
-
ISSN:0734-211X
-
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
-
language:
-
Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
21 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Microlithography;digital Encyclopedia of Applied Physics;2003-04-15
2. Experimental model of industrial x-ray source MSX-1 with a vacuum spark for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001
3. Edge diffraction enhanced printability in x-ray nanolithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11
4. Microfabrication using synchrotron radiation;Reports on Progress in Physics;1998-04-01
5. The printing conditions for 0.13μm features in x-ray lithography using Pohang light Source;Microelectronic Engineering;1998-03