Author:
Simon K.,Gabeli F.,Rohrmoser W.,Seedorf S.,Scheunemann H.-U.,Huber H.L.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. An X-ray stepper;Cullmann;SPIE,1983
2. Application of X-ray steppers using optical alignment for synchrotron based X-ray lithography;Huber;Microelectronic Eng.,1988
3. An X-ray stepper for production lithography;Cullmann;SPIE,1989
4. A. Flamholz, R. Rippstein; X-ray stepper exposure system performance and status, Proceeding of the EIPB '90, San Antonio, Texas, to be published
5. K.A. Cooper, Steppers for X-ray microlithography, Microlithography Workshop Campinas Brazil 89
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