Recent progress in ion beam lithography

Author:

Brown W.L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Germanium selenide: A resist for low‐energy ion beam lithography

2. Stengl, G., Loschner, H., Hammel, E. and Wolf, E.D., Proc. 17th European Solid State Device Research Conf, Bologna, Italy (North-Holland).

3. Angular intensity of a gas‐phase field ionization source

4. H2 and rare gas field ion source with high angular current

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1. FOCUSED ION BEAM FABRICATION TECHNIQUES FOR OPTOELECTRONICS;Integrated Optoelectronics;1995

2. In-Situ Processing and Selective Area Epitaxy;Gas Source Molecular Beam Epitaxy;1993

3. Miniaturized Liquid Metal Ion Sources (MILMIS);Nanosources and Manipulation of Atoms Under High Fields and Temperatures: Applications;1993

4. High‐field ion sources and applicationsa);Review of Scientific Instruments;1992-05

5. Layering Technologies;The Physics of Micro/Nano-Fabrication;1992

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