Pulsed laser deposition: a new technique for deposition of amorphous SiO thin films-Reference-Cited by-同舟云学术

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Pulsed laser deposition: a new technique for deposition of amorphous SiO thin films

Published:2003-01 Issue: Volume:163-164 Page:300-305
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Lackner J.M.,Waldhauser W.,Ebner R.,Lenz W.,Suess C.,Jakopic G.,Leising G.,Hutter H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference24 articles.

1. Pulsed Laser Deposition of Thin Films,1994

2. Synthesis of SiO2 thin films by reactive excimer laser ablation

3. Properties of silicon dioxide films prepared by pulsed‐laser ablation

4. Pulsed laser deposition of silicon films for solar cell applications

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