Structure and composition of TixAl1−xN thin films sputter deposited using a composite metallic target
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference37 articles.
1. TiN coatings on mild steel substrates with electroless nickel as an interlayer
2. Structure, hardness and adhesion in electroless nickel interlayer modified TiN coating on mild steel
3. Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure
4. Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure
5. Electron microscopy analysis of the microstructure of Ti1−xAlxN alloy thin films prepared using a chemical vapour deposition method
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1. Effects of Cr Concentration on the Structure and the Electrical and Optical Properties of Ti-Al-Cr-N Thin Films Prepared by Means of Reactive Co-Sputtering;Crystals;2022-12-15
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