Nickel aluminide thin film fabrication via ion beam sputtering of compound targets
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference13 articles.
1. Structure, chemistry and bonding at grain boundaries in Ni3Al—I. The role of boron in ductilizing grain boundaries
2. Near Atomic Scale Studies of Electronic Structure at Grain Boundaries in Ni3Al
3. Ion plating: optimum surface performance and material conservation
4. Composition of thin films deposited by ion beam sputtering of a compound target: case of YBaCuO
5. Influence of reflected primary ions and nonunity sticking coefficients on film stoichiometry during ion-beam-sputter deposition of multicomponent targets
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings;Journal of Vacuum Science & Technology A;2023-10-17
2. Synthesis and characterization of sputter-deposited Ni-rich Ni3Al hard coatings;Journal of Alloys and Compounds;2022-12
3. X-ray photoelectron spectroscopic studies on oxidation behavior of nickel and iron aluminides under oxygen atmosphere at low pressures;Applied Surface Science;2008-06
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