Chemically vapor-deposited silicon carbide films for surface protection-Reference-Cited by-同舟云学术

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Chemically vapor-deposited silicon carbide films for surface protection

Published:1998-03 Issue: Volume:100-101 Page:149-152
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hoerner A.,Vierhaus J.,Burte E.P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference7 articles.

1. Proc. SPIE;Luethje,1987

2. Low‐temperature and selective growth of β‐SiC using the SiH2Cl2/C3H8/H2/HCl gas system

3. Chemical Kinetics;Laidler,1965

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental and numerical investigation on SiC coating delamination from C/SiC composites;Composites Science and Technology;2015-04

2. The Structure Studies on Si-N Thin Layers;Solid State Phenomena;2007-12

3. Micro-machined electron transparent alumina vacuum windows;Sensors and Actuators A: Physical;2000-12

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