Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference25 articles.
1. Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials
2. Characteristics of SiOF Films Formed by Remote Plasma Enhanced Chemical Vapor Deposition with $\bf SF_{6}$ Gas
3. Application of Surface Reformed Thick Spin‐on‐Glass to MOS Device Planarization
4. A Study on Low Dielectric Material Deposition Using a Helicon Plasma Source
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