Influence of Ti addition on the properties of W–Ti–C/N sputtered films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference37 articles.
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5. Evaluation of in situ formed W–Ti and MoSi2 as a diffusion barrier to Al for CoSi2 silicided contact
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