Computer simulations and experimental results in studies of plasma dynamics during the impulse plasma deposition process
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference10 articles.
1. Spectroscopic study of a pulse plasma used for production and deposition of TiN films
2. Electric charge influence on the metastable phase nucleation
3. Mechanism of crystallization of multicomponent metallic coatings using the impulse plasma method
4. Physical model of dynamic phenomena in impulse plasma coaxial accelerator
5. Plasma Acceleration with Coaxial Electrodes
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2. Estimation of the plasma sheath thickness and particle number density in the axial phase of plasma coaxial accelerator;Vacuum;2017-04
3. Computational modelling of discharges within the impulse plasma deposition accelerator with a gas valve;Physica Scripta;2014-05-01
4. Magnetohydrodynamic simulation for plasma focus devices;Plasma Devices and Operations;2007-12
5. Concept, techniques, deposition mechanism of impulse plasma deposition — A short review;Surface and Coatings Technology;2007-02
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