Growth of Hf(C,N) thin films on Si(100) and D2 steel substrates by plasma assisted MOCVD-Reference-Cited by-同舟云学术

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Growth of Hf(C,N) thin films on Si(100) and D2 steel substrates by plasma assisted MOCVD

Published:2000-09 Issue:1-3 Volume:131 Page:73-78
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Han J.G.,Cho Y.K.,Yoon J.S.,Rie K.T.,Roh W.C.,Jung D.,Lee S.W.,Boo J.-H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

1. Handbook of Thin Films Process Technology;Knotek,1995

2. Growth and Properties of Low Pressure Chemical-Vapor-Deposited TiN for Ultra Large Scale integration

3. Synthesis of thin coatings by plasma-assisted chemical vapour deposition using metallo-organic compounds as precursors

4. Low pressure MOCVD of TiN thin films

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf–C–N coatings;Surface and Coatings Technology;2016-01

2. Chapter 9. Metal-organic Chemical Vapour Deposition of Refractory Transition Metal Nitrides;Chemical Vapour Deposition

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