Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf–C–N coatings-Reference-Cited by-同舟云学术

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Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf–C–N coatings

Published:2016-01 Issue: Volume:286 Page:251-255
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Piedrahita Will F.,Coy L. Emerson,Amaya César,Llarena Irantzu,Caicedo Julio César,Yate Luis

Funder

National Centre for Research and Development

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference37 articles.

1. Magnetron sputtering of tin protective coatings for medical applications

2. Carbon-containing Ti–C:H and Cr–C:H PVD hard coatings

3. Thermal stability of Cr-doped diamond-like carbon films synthesized by cathodic arc evaporation

4. Hard coating performance enhancement by using [Ti/TiN]n, [Zr/ZrN]n and [TiN/ZrN]n multilayer system

5. Microstructure, micro-mechanical and tribological properties of the nc-WC/a-C nanocomposite coatings magnetron sputtered on non-hardened and oxygen hardened Ti–6Al–4V alloy

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1. Dependence of the M choice on the properties of Hf(M)SiCN (M = Nb, Ta, Ti, Zr) ceramic coatings: ab-initio and experimental study;Tribology International;2024-08

2. Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al₂O₃/HfO₂/SiO₂ and HfO₂/Al₂O₃/SiO₂ Trilayers for Ultraviolet Laser Applications;ACS Applied Materials & Interfaces;2024-06-05

3. Ablation behavior of a novel carbonitrides HfC0.68N0.32 coating for C/C composites in laser and oxyacetylene environment;Journal of the European Ceramic Society;2024-05

4. Nanoparticles‐doped polymer‐derived SiCN ceramic with enhanced mechanical properties and electromagnetic wave absorption;Journal of the American Ceramic Society;2024-01-26

5. Enhanced performance of MoS2 phototransistors with ferroelectric HfLaON as gate dielectric through NH3-plasma treatment followed by rapid thermal annealing;Ceramics International;2023-12

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