Design of an ultra-miniaturized electron optical microcolumn with sub-5 nm very high resolution-Reference-Cited by-同舟云学术

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Design of an ultra-miniaturized electron optical microcolumn with sub-5 nm very high resolution

Published:2014-01 Issue: Volume:136 Page:171-175
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Oh Tae-Sik,Kim Ho-Seob,Ahn Seungjoon,Kim Dae-Wook

Funder

Sun Moon University Research

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. An electron-beam microcolumn with improved resolution, beam current, and stability;Kratschmer;J. Vac. Sci. Technol. B,1995

2. Miniature low voltage beam systems producible by combined lithographies;Koops;Nucl. Instrum. Methods Phys. Res. A,1995

3. Electron-beam microcolumns for lithography and related applications;Chang;J. Vac. Sci. Technol. B,1996

4. Experimental evaluation of arrayed microcolumn lithography;Muray;Microelectron. Eng.,2000

5. Multiple electron-beam lithography;Chang;Microelectron. Eng.,2001

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