Monte Carlo modeling of ion beam induced secondary electrons-Reference-Cited by-同舟云学术

Monte Carlo modeling of ion beam induced secondary electrons

Published:2016-09 Issue: Volume:168 Page:28-33
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Huh U.,Cho W.,Joy D.C.

Funder

Center of Excellence

Center for Materials Processing at the University of Tennessee, Knoxville

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. J.S.C.M.J. Berger, M.A. Zucker, J. Chang, Stopping-Power and Range Tables for Electrons, Protons, and Helium Ions, 2011, Available: 〈http://www.nist.gov/pml/data/star/index.cfm〉.

2. D.C. Joy, Protons, Ions, Electrons and the Future of the SEM, in: Proceedings of Electron-Microscopy-and-Analysis-Group Conference, Sheffield, England, 2009.

3. Quest for high brightness, monochromatic noble gas ion sources;Tondare;J. Vac. Sci. Technol. A,2005

4. Measuring the performance of scanning electron microscope detectors;Joy;Scanning,1996

5. Secondary electron imaging in the variable pressure scanning electron microscope;Mohan;Scanning,1998

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