Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference3 articles.
1. Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law
2. Densification of synthetic fused silica under ultraviolet irradiation
3. Testing of optical materials for 193-nm applications
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