Testing of optical materials for 193-nm applications
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SPIE
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Damage behavior of SiO 2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser;Laser-Induced Damage in Optical Materials: 2000;2001-04-12
2. Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses;Laser-Induced Damage in Optical Materials: 2000;2001-04-12
3. Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses;Journal of Non-Crystalline Solids;2000-03
4. Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride;SPIE Proceedings;1999-07-26
5. Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law;Journal of Non-Crystalline Solids;1999-03
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