Influence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD-Reference-Cited by-同舟云学术

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Influence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD

Published:2002-04 Issue: Volume:299-302 Page:880-884
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Itoh T,Fujiwara T,Katoh Y,Fukunaga K,Nonomura S

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Optoelectronics and Photovoltaic Applications of Microcrystalline Sic

2. T. Itoh, Y. Katoh, T. Fujiwara, K. Fukunaga, S. Nonomura, S. Nitta, Thin Solid Films 395 (2001) 240

3. T. Itoh, K. Fukunaga, Y. Katoh, T. Fujiwara, S. Nonomura, Solar Energy Mater. Solar Cells, in press

4. CRC Handbook of Chemistry and Physics,1994

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1. Transformation from amorphous to nano-crystalline SiC thin films prepared by HWCVD technique without hydrogen dilution;Bulletin of Materials Science;2015-09

2. Effect of Plasma Power on Structure of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High Frequency Plasma-Enhanced Chemical Vapor Deposition at a Low Substrate Temperature;Japanese Journal of Applied Physics;2008-05-16

3. Properties of hetero-structured SiCX films deposited by hot-wire CVD using SiH3CH3 as carbon source;Thin Solid Films;2008-01

4. Heterojunction Amorphous Silicon Solar Cells with n-Type Microcrystalline Cubic Silicon Carbide as a Window Layer;Japanese Journal of Applied Physics;2007-02-08

5. Film Properties of Nanocrystalline 3C–SiC Thin Films Deposited on Glass Substrates by Hot-Wire Chemical Vapor Deposition Using CH4as a Carbon Source;Japanese Journal of Applied Physics;2007-01-10

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