Surface reactions in very low temperature (<150°C) hydrogenated amorphous silicon deposition, and applications to thin film transistors
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference23 articles.
1. Preparation of highly photoconductive amorphous silicon by rf sputtering
2. M. Kitigawa, K. Setsune, Y. Marabe, T. Hirao, Jpn. J. Appl. Phys. 27 (1988) 2026
3. Post‐deposition relaxation of electronic defects in hydrogenated amorphous silicon
4. Device‐quality wide‐gap hydrogenated amorphous silicon films deposited by plasma chemical vapor deposition at low substrate temperatures.
5. Deposition of amorphous silicon using a tubular reactor with concentric‐electrode confinement
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1. Hydrogenated Amorphous Silicon Thin-Film Transistors;Amorphous Silicon Thin-Film Transistors;2023
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4. Electrical Properties of Metal–Silicon Nitride–Hydrogenated Amorphous Silicon Capacitor Elucidated Using Admittance Spectroscopy;Japanese Journal of Applied Physics;2008-12-19
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