Oxidation mechanism of amorphous silicon in air
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference30 articles.
1. Porosity and oxidation of amorphous silicon films prepared by evaporation, sputtering and plasma-deposition
2. Spontaneous Inclusion of Oxygen in Sputter-Deposited Amorphous Silicon during and after Fabrication
3. Influence of oxygen and deposition conditions on sputtered a-Si
4. Properties of Amorphous Si Prepared by RF Sputtering with a High Ar Pressure
5. Oxidation mechanisms in high pressure dc-sputtered a-Si films
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