Numerical simulation of the temperature distribution in a planetary MOCVD reactor-Reference-Cited by-同舟云学术

Numerical simulation of the temperature distribution in a planetary MOCVD reactor

Published:2014-07 Issue: Volume:81 Page:48-58
ISSN:0255-2701
Container-title:Chemical Engineering and Processing: Process Intensification
language:en
Short-container-title:Chemical Engineering and Processing: Process Intensification

Author:

Tsai Ming-Lun,Fang Cheng-Chia,Lee Lung-Yu

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Process Chemistry and Technology,Energy Engineering and Power Technology,General Chemical Engineering,General Chemistry

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4. Metalorganic chemical vapor deposition for optoelectronic devices;Coleman;Proc. IEEE,1997

5. Numerical analysis for the growth of GaN layer in MOCVD reactor;Shin;J. Cryst. Growth,2003

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