Chemical vapour deposition of alumina on cutting tool inserts from AlCl3-H2-CO2 mixtures: Influence of the chemical vapour deposition parameters and the nature of the inserts on the morphology and wear resistance of the coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics
Reference12 articles.
1. Vapor-Phase Growth of Alpha Alumina Single Crystals
2. Proc. Structural Ceramic Design Processes Semin.;Ellis,1969
3. INFLUENCE OF DEPOSITION TEMPERATURE ON PROPERTIES OF HYDROLYTICALLY GROWN ALUMINUM OXIDE FILMS
4. Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2System
5. Properties of Al2 O 3 Films Deposited from the AlCl3, CO 2, and H 2 System
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