Chemical vapour deposited tungsten carbide wear-resistant coatings formed at low temperatures-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Chemical vapour deposited tungsten carbide wear-resistant coatings formed at low temperatures

Published:1978-06 Issue:2 Volume:48 Page:237-250
ISSN:0043-1648
Container-title:Wear
language:en
Short-container-title:Wear

Author:

Archer N.J.,Yee K.K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics

Reference15 articles.

1. Vapour Deposition;Powell,1966

2. British Patent 1,326,769 (1973), to R. H. Lewin and C. Hayman.

3. British Patent Application 11,818 (1975), to N. J. Archer and C. Hayman.

4. Proc. 5th Int. Conf. on Chemical Vapour Deposition;Mantle,1975

5. U. S. Patent 3,721,577 (1973), to P. F. Woerner.

Cited by 41 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition;Journal of Vacuum Science & Technology A;2022-09

2. Tungsten Carbides;Ultra-High Temperature Materials IV;2022

3. Simulation of High-Temperature Solid Particle Erosion of HVOF-Sprayed NiCrBSiFe and WC-Co/NiCrBSiFe-Coated Wall Using CFD;Lecture Notes on Multidisciplinary Industrial Engineering;2020

4. Effect of sub-layer temperature during HFCVD process on morphology and corrosion behavior of tungsten carbide coating;International Journal of Applied Ceramic Technology;2018-08-29

5. Microstructure and growth mechanism of tungsten carbide coatings by atmospheric CVD;Surface and Coatings Technology;2018-06

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP