On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition

Abstract

Tungsten carbonitride [W(C,N)] was deposited on cemented carbide substrates by chemical vapor deposition (CVD) in a hot-wall reactor using tungsten hexafluoride ([Formula: see text]), acetonitrile ([Formula: see text]CN), and hydrogen ([Formula: see text]) as precursors. Tungsten carbides and nitrides with a hexagonal [Formula: see text]-WC type structure are generally difficult to obtain by CVD. Here, it was found that the combination of [Formula: see text] and [Formula: see text]CN precursors enabled the deposition of W(C,N) coatings with a [Formula: see text]-WC type structure and columnar grains. A process window as a function of the deposition temperature and precursor partial pressures was determined to establish the conditions for the deposition of such coatings. Scanning electron microscopy, x-ray diffraction, electron backscatter diffraction, and elastic recoil detection analysis were used for the investigation of the coating thickness, microstructure, texture, and composition. From the investigation of the kinetics, it was concluded that the growth was mainly controlled by surface kinetics with an apparent activation energy of 77 kJ/mol, yielding an excellent step coverage. The partial reaction orders of the reactants together with their influence on the microstructure and coating composition was further used to gain a deeper understanding of the growth mechanism. Within the process window, the microstructure and the texture of the W(C,N) coatings could be tailored by the process parameters, enabling microstructural engineering with tuning of the mechanical properties of the W(C,N) coatings. The nanoindentation hardness (36.6–45.7 GPa) and elastic modulus (564–761 GPa) were found to be closely related to the microstructure.