Author:
Yamamoto N,Kishi K,Kondo Y,Matsumoto S,Iga R,Kadota Y,Okamoto H,Mawatari H
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Cited by
2 articles.
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1. Low-Damage Indium Phosphide Sidewall Formation by Reactive Ion Etching;Japanese Journal of Applied Physics;2002-02-28
2. Low damage InP sidewall formation by reactive ion etching;Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)