Optimized channel thickness for high electron mobility in pseudomorphic In0.74Ga0.26As/In0.52Al0.48As quantum-well HEMT structures with (411)A super-flat interfaces grown by MBE
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference24 articles.
1. 50-nm self-aligned-gate pseudomorphic AlInAs/GaInAs high electron mobility transistors
2. 30-nm-Gate InP-Based Lattice-Matched High Electron Mobility Transistors with 350 GHz Cutoff Frequency
3. Extremely Flat Interfaces in GaAs/AlGaAs Quantum Wells Grown on GaAs (411)A Substrates by Molecular Beam Epitaxy
4. Extremely high uniformity of interfaces in GaAs/AlGaAs quantum wells grown on (411)A GaAs substrates by molecular beam epitaxy
5. Super-flat interfaces in In0.53Ga0.47As/In0.52Al0.48As quantum wells grown on (411)A InP substrates by molecular beam epitaxy
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1. Quantum well engineering of InAlAs/InGaAs HEMTs for low impact ionization applications;Current Applied Physics;2013-05
2. E-Band Low-Noise Amplifier MMICs Using Nanogate InGaAs/InAlAs HEMT Technology;IEICE Transactions on Electronics;2010
3. 35-nm-Gate In0.7Ga0.3As/In0.52Al0.48As HEMT with 520-GHz fT;2007 IEEE 19th International Conference on Indium Phosphide & Related Materials;2007-05
4. Effects of Heterointerface Flatness on Device Performance of InP-Based High Electron Mobility Transistor;Japanese Journal of Applied Physics;2007-04-24
5. Thermal stability of Ti/Pt/Au ohmic contacts for cryogenically cooled InP-based HEMTs on (411)A-oriented substrates by MBE;Journal of Crystal Growth;2007-04
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