Damage formation in Si(100) induced by MeV self-ion implantation

Author:

Qing-tai Zhao,Zhohg-lie Wang,Tian-bing Xu,Pei-ran Zhu,Jun-si Zhou,Xiang-dong Liu,Ji-tian Liu,Ke-ming Wang

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Effect of substrate temperature on the radiation damage from MeV Si implantation in Si;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-01

2. Effects of the ion energy on damage production in MeV ion-implanted GaAs;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2001-04

3. Damage formation during 1.0 MeV Si self-implantation at low temperatures;Journal of Electronic Materials;1999-04

4. Monte Carlo simulation of silicon amorphization during ion implantation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;1998-12

5. Measurement and Modelling of the Radiation Damage of Silicon by MeV Ag Ions;MRS Proceedings;1998

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