MeV ion implantation in GaAs technology
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference26 articles.
1. High‐energy (56 MeV) oxygen implantation in Si, GaAs, and InP
2. MeV ion damage in GaAs single crystals: Strain saturation and role of nuclear and electronic collisions in defect production
3. Phonon shifts in ion bombarded GaAs: Raman measurements
4. Defect strain fields in epitaxial GaAs
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1. Impact of MeV-Ag ions irradiation of silicon substrate on structural and optical properties of porous silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-03
2. MeV-Fe ions implantation of GaAs – Induced morphological and structural modification of porous GaAs;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2021-04
3. Electrical Characteristics of GaAs Implanted with High Energy (100 MeV) 28Si and 120Sn Ions;Applied Mechanics and Materials;2014-10
4. Stopping power of GaAs for swift protons: Dielectric function and optical-data model calculations;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2010-06
5. Dose dependence and annealing behaviour of radiation-induced defects in implanted GaAs;Radiation Measurements;2003-06
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