High-dose iron implantation into silicon and metals-Reference-Cited by-同舟云学术

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High-dose iron implantation into silicon and metals

Published:1990-04 Issue:1-4 Volume:50 Page:384-390
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Müller G.,Klingelhöfer G.,Schwalbach P.,Kankeleit E.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference33 articles.

1. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

2. Mössbauer study of heat treated57Fe implanted silicon

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Depth analysis of buried iron disilicide formation by Fe ion implantation into Si;Applied Physics Letters;2000-03-13

2. Depth analysis of phase formation in Si after high-dose Fe ion implantation by depth-selective conversion-electron Mössbauer spectroscopy;Applied Physics Letters;1997-05-19

3. Effect of ion current density on the phase composition of ion beam synthesized iron silicides in Si (100);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-05

4. Applications of conversion electron Mössbauer spectrometry (CEMS);Journal of Radioanalytical and Nuclear Chemistry Articles;1996-01

5. Beam induced phase transformations and self annealing in as-implanted iron silicides;Applied Surface Science;1995-10

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