A system and performance overview of the EXTRION 220 medium-current ion implanter-Reference-Cited by-同舟云学术

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A system and performance overview of the EXTRION 220 medium-current ion implanter

Published:1991-04 Issue:1-4 Volume:55 Page:423-427
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Pippins Michael W.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference7 articles.

1. these Proceedings 8th Int. Conf. on Ion Implantation Technology;Kaim,1991

2. Proc. 7th Int. Conf. on Implantation Technology;Berrian,1989

3. Proc. 7th Conf. on Ion Implantation Technology;Pollock,1989

4. these Proceedings 8th Conf. on Ion Implantation Technology;Milgate,1981

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion Beam Technology;Ion Beams in Materials Processing and Analysis;2012

2. Metals contamination in high and medium current implanters;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03

3. Characterization of a Bernas ion source for multiply charged ion implantation;Review of Scientific Instruments;1994-04

4. MODERN IMPLANTERS WITH BF2+ DISSOCIATION;Ion Implantation Technology–92;1993

5. Operating Characteristics of a Bernas Ion Source for the Varian E220/500 Ion Implanter;Ion Implantation Technology–92;1993

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