Operating procedure for improving ion source lifetime for the 80-180XP ion implanter
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference5 articles.
1. A new ion source for electromagnetic isotope separators
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3. Ion and Atomic Beams for Controlled Fusion and Technology;Gabovich,1989
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization of a Bernas ion source for multiply charged ion implantation;Review of Scientific Instruments;1994-04
2. A High Current Multicusp Ion Source For Ion Implantation;Ion Implantation Technology–92;1993
3. Operating Characteristics of a Bernas Ion Source for the Varian E220/500 Ion Implanter;Ion Implantation Technology–92;1993
4. Enhanced Performance Ion Sources for the PI9200XJ Ion Implantation System;Ion Implantation Technology–92;1993
5. A high‐current microwave ion source for ion implantation;Review of Scientific Instruments;1992-04
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