Author:
Spinelli P.,Biasse B.,Jaussaud C.,De Pontcharra J.,Soubie A.,Bruel M.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference5 articles.
1. Oxygen distributions in synthesized SiO2 layers formed by high dose O+ implantation into silicon
2. Proc. Fifth Int. Conf. on Ion Implantation Equipment and Techniques;Guerra,1985
3. Impurity Doping;Maes,1981
Cited by
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