A study of damage induced in semiconductors and metals during microchanneling measurements-Reference-Cited by-同舟云学术

A study of damage induced in semiconductors and metals during microchanneling measurements

Published:1991-03 Issue:1-3 Volume:54 Page:204-208
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Piette M.,Bodart F.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference9 articles.

1. Backscattering Spectrometry;Chu,1978

2. Materials Analysis by Ion Channeling;Feldman,1982

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 50 years of ion channeling in materials science;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2016-03

3. Imaging with high velocity focused ion beams;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-09

4. Scanning mu-analysis of SiCSi3N4 material by proton non-Rutherford elastic backscattering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-05