The precise determination by NRA of the relative stoichiometry of silicon nitride thin films on heavy substrates
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
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1. Physical and Chemical Properties of Magnetron Sputtered Silicon Nitride Films;Carrière,1988
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1. Diffusion in Metals and Alloys;Physical Metallurgy;2014
2. Nuclear Reaction Analysis (NRA);Surface and Thin Film Analysis;2011-04-12
3. Compositional analysis of silicon nitride films on Si and GaAs by backscattering spectrometry and nuclear resonance reaction analysis;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-12
4. Influence of Hydrogen Incorporation on the Structure and Stoichiometry of Chemically Vapor Deposited Silica Films;Chemistry of Materials;2001-09-20
5. Comparison of the physical and electrical properties of electron cyclotron resonance and distributed electron cyclotron resonance SiO2;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-07
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