Influence of Hydrogen Incorporation on the Structure and Stoichiometry of Chemically Vapor Deposited Silica Films
Author:
Affiliation:
1. Departamento de Física e Ingeniería de Superficies, Instituto de Ciencia de Materiales de Madrid, CSIC, Cantoblanco, 28049 Madrid, Spain
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm011040k
Reference62 articles.
1. Structural Evaluation of Silicon Oxide Films
2. Disorder in vitreous SiO2: The effect of thermal annealing on structural properties
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4. Disorder-induced vibration-mode coupling inSiO2films observed under normal-incidence infrared radiation
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