The checkerboard technique: An essential progress in SIMS data acquisition and evaluation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference8 articles.
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4. Production and in-situ analysis of microscale oxide structures in silicon by oxygen implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-01
5. Test structures for secondary ion mass spectrometry analysis of patterned silicon wafers;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1992-07
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