Performance characteristics of the Genus Inc. IX-1500 high energy ion implantation system
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
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1. Sources of Low-Charge-State Positive-Ion Beams1 1Research was sponsored by the U.S. Department of Energy under Contract No. DE-AC05-84OR21400 with Martin Marietta Energy Systems, Inc.;Methods in Experimental Physics;1995
2. Performance characteristics of the Genus Inc. 1510 high energy ion implantation system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-04
3. Ion sources for accelerators in materials research;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-02
4. Performance characteristics of the Genus Inc. 1510 high energy ion implantation system;Ion Implantation Technology–92;1993
5. The beam performance of the Genus G-1500 ion implanter;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
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