1. these Proceedings 7th Int. Conf. on Implantation Technology;Sampayan,1989
2. Eaton Corp., Semiconductor Equipment Division, 2433 Rutland Drive, Austin, Texas, 78758, USA.
3. Discharge of P2+ ions in the beamline of medium current implanters
4. Recent improvements in double charged ion beam energy purity for serial process ion implanters
5. W. Bygrave, P. Treado and J. Lambert, Accelerator Nuclear Physics (High Voltage Engineering Corporation, Burlington, Massachusetts 01803, USA).