Particle contamination in implanters-Reference-Cited by-同舟云学术

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Particle contamination in implanters

Published:1989-02 Issue: Volume:37-38 Page:486-491
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Smith T.C.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference24 articles.

1. R.A. Bowling and G.B. Larrabee, 1986 Microcontamination Conf. Proc., (Canon Communications, Inc., Santa Monica, CA) p. 161.

2. A simple method for modeling VLSI yields

3. Comments on “some considerations in the formulation of IC yield statistics”

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. ULSI-process demands of contamination control on ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03

2. Ion Implanters;Ion Implantation: Basics to Device Fabrication;1995

3. Experimental Evidence for Beam Particulate Transport in Ion Implanters;Ion Implantation Technology–92;1993

4. Experimental observation of particle entrapment and transport in an intense ion beam;Journal of Applied Physics;1992-03-15

5. On the transport and heating of particulate contamination entrapped in an intense cylindrical ion beam;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1991-09

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