Charge neutralization in ion implanters-Reference-Cited by-同舟云学术

Charge neutralization in ion implanters

Published:1995-03 Issue:1-2 Volume:96 Page:22-29
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Smatlak D.L.,Mack M.E.,Mehta S.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference21 articles.

1. Progress in wafer charging and charge neutralization

2. Charge Neutralization, U.C. Extension Short Course, Wafer Charging Effects in Ion Implantation Processing, Dallas;Mack,1993

3. Role of the Beam/Plasma Potential in Charging Damage, U.C. Extension Short Course, Wafer Charging Effects in Ion Implantation Processing, Dallas;Vella,1993

4. Ion beam system design for ULSI device requirements

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