Focused ion beam technologies for lithographic applications-Reference-Cited by-同舟云学术

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Focused ion beam technologies for lithographic applications

Published:1989-02 Issue: Volume:37-38 Page:218-223
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Kato Tadao,Yasuoka Akihiko,Fujikawa Kyoichiro

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference16 articles.

1. Ion source of high brightness using liquid metal

2. Abstract: Intense field‐emission ion source of liquid metals

3. High‐resolution, ion‐beam processes for microstructure fabrication

4. 400‐Å high aspect‐ratio lines produced in poylmethyl methacrylate (PMMA) by ion‐beam exposure

5. Ion beam exposure profiles in PMMA–computer simulation

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. FOCUSED ION BEAM FABRICATION TECHNIQUES FOR OPTOELECTRONICS;Integrated Optoelectronics;1995

2. The technology of finely focused ion beams;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04

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