Microwave ion source for ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference33 articles.
1. A new ion source for electromagnetic isotope separators
2. High energy ion implantation for C-MOS isolation n-wells technology: Problems related to the use of multicharged phosphorous ions in an industrial context
3. Study of the characteristics of the ion beam extracted from an rf discharge in hydrogen under conditions of resonance
4. Electron Cyclotron Resonance Multiply Charged Ion Sources
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