Novel dielectric/silicon planar structures formed by ion beam synthesis-Reference-Cited by-同舟云学术

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Novel dielectric/silicon planar structures formed by ion beam synthesis

Published:1987-01 Issue:1-4 Volume:21 Page:129-133
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Hemment P.L.F.,Reeson K.J.,Kilner J.A.,Chater R.J.,Marsh C.,Booker G.R.,Davis J.R.,Celler G.K.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference17 articles.

1. High-voltage CMOS SIMOX technology and its application to a BSH-LSI

2. Electrochem. Society Meeting;Tsaur,1986

3. IEEE SOS/SOI Workshop;Davis,1985

4. Microstructure of silicon implanted with high dose oxygen ions

5. High quality Si‐on‐SiO2films by large dose oxygen implantation and lamp annealing

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