Ion implantation for large-area optoelectronics on glass substrates
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. High Dose Implantation of Nitrogen and Phosphor into Silica Glass
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4. Crystal Nucleation in Amorphous Si Films on Glass Substrate by Si+ Ion Implantation
5. Grain‐size distribution in ion‐irradiated amorphous Si films on glass substrates
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1. A new method for charge trapping measurement during electron beam irradiation: application to glass containing alkali ions and single-crystalline quartz;Journal of Physics D: Applied Physics;2004-07-15
2. Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials;Journal of Electronic Materials;2001-02
3. Low resistivity layers and Schottky contacts in amorphous silicon by Co+ implantation;Electronics Letters;1998
4. Bi- or multi-modal distribution of ion-implanted bismuth in fused silica;Journal of Non-Crystalline Solids;1995-12
5. Ion implantation into heated soda-lime glass substrates;Journal of Non-Crystalline Solids;1995-08
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